設備名稱 Equipment Name

管式等離子體多晶硅薄膜淀積爐  Horizontal PECVD (poly-Si)

設備型號 Equipment Model

PD-520

設備用途 Equipment Application

本設備主要用于N-TOPCon電池制備隧穿氧化層、本征poly-si、摻雜poly-si、掩膜層。

This equipment is mainly used for the deposition of tunnel oxide layer, intrinsic poly-si layer, poly-si layer doping and mask layer for TOPCon solar cells.

工藝流程  Process Flow

石墨舟及硅片準備→管內充氮氣→進舟→抽真空、壓力測試→淀積多層復合膜→抽真空、壓力測試→清管路、充氮氣→退舟

Graphite boat & wafers ready→nitrogen inlet→graphite boat load in→vacuumize, pressure test→multi layers deposition→vacuumize, pressure test→Pipe purging, nitrogen inlet→graphite boat unload

技術特點  Features

1、隧穿氧化層、本征poly-Si、摻雜poly-Si、掩膜層，四種工藝薄膜一次原位完成。

Tunnel oxide layer, intrinsic Poly-Si, doping Poly-Si, mask layer, four processes completed in one in-situ doping.

2、具備原位清洗功能。
With in-situ clean. 

3、雙水冷密封技術。
Double water-cooled sealing technology.

4、專利內加熱技術。
Patented internal heating technology.

5、高速平穩整體模組推舟機構。
High-speed integral module boat pushing mechanism.

6、懸浮承載舟技術。
Graphite boat contact-free with quartz tube.

7、自主知識產權MES軟件。
MES software with independent intellectual property right.

8、自主開發中央計算機集中控制系統。

Independently developed CCC system.

9、快速鍍膜技術。
Fast coating technology.

10、全面的防超溫、斷偶、撞舟等安全報警保護功能。

Alarm protection for over-heating, thermocouple-break and boat collision.

設備參數  Parameters